发明名称 Method for forming a linear heterojunction field effect transistor
摘要 A low power heterojunction field effect transistor (10, 30, 50, 60) capable of operating at low drain currents while having a low intermodulation distortion. A channel restriction region (9, 38, 51) is formed between the gate electrodes (24, 41, 69) and the drain electrodes (25, 46, 65). The channel restriction region (9, 38, 51) depletes the channel layer (13, 33) thereby constricting a channel and lowering a drain saturation current. The channel restriction region (9, 38, 51) may be used to set a desired drain saturation current such that a second derivative of the transconductance with respect to the gate-source voltage is approximately zero and a first derivative of the transconductance with respect to the gate-source voltage is, approximately, a relative maximum at the desired operating point.
申请公布号 US5482875(A) 申请公布日期 1996.01.09
申请号 US19940229266 申请日期 1994.04.18
申请人 MOTOROLA, INC. 发明人 VAITKUS, RIMANTAS L.;TEHRANI, SAIED N.;NAIR, VIJAY K.;GORONKIN, HERBERT
分类号 H01L29/812;H01L21/338;H01L29/08;H01L29/10;H01L29/778;H01L29/80;(IPC1-7):H01L21/335 主分类号 H01L29/812
代理机构 代理人
主权项
地址