| 发明名称 |
Method for removing copper oxide on the surface of a copper film and a method for patterning a copper film |
| 摘要 |
A method for removing copper oxide on a surface of a copper film is comprising the steps of treating the surface of the copper film with acid, neutralizing the surface of the copper film treated with acid, and washing the neutralized surface of the copper film.
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| 申请公布号 |
US5482174(A) |
申请公布日期 |
1996.01.09 |
| 申请号 |
US19940253559 |
申请日期 |
1994.06.03 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
NAMIKI, TAKAHISA;YAMAGISHI, YASUO;YANO, EI |
| 分类号 |
C23G1/10;C23G5/032;H01L21/304;H05K3/06;H05K3/22;H05K3/24;H05K3/26;(IPC1-7):B44C1/22;C23F1/00 |
主分类号 |
C23G1/10 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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