发明名称 Semiconductor laser and method of manufacturing the same
摘要 In a semiconductor laser having a p-type cladding layer consisting of GaInP or AlGaInP, an operating voltage is decreased. In a semiconductor laser formed on a GaAs substrate and having a p-type cladding layer consisting of GaInP or AlGaInP and a p-type contact layer consisting of GaAs or GalnAs, p-type buffer layers are formed between the p-type cladding layer and the p-type contact layer, which consists of a compound containing both arsenic (As) and phosphorus (P) and having a medium bandgap between those of the two layers.
申请公布号 US5479427(A) 申请公布日期 1995.12.26
申请号 US19940196434 申请日期 1994.02.15
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 YOSHIDA, ICHIRO;KATSUYAMA, TSUKURU;HASHIMOTO, JUNICHI
分类号 H01S5/00;H01L33/00;H01S5/223;H01S5/32;H01S5/343;(IPC1-7):H01S3/18 主分类号 H01S5/00
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