发明名称 |
PHOTORESIST COMPOSITION INCLUDING POLYPHENOL AND SENSITIZER |
摘要 |
A photoresist composition, and a process for using the same are; the composition comprises a polyphenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkali solubility to said composition, wherein said resin is represented by the formula (I) or (II): <IMG> (I) <IMG> <IMG> (II) wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group or an aryl group; R' is a silyl group; and n and n'+m are greater than 3. The composition exhibits high thermal and plasmal resistance and good dissolution characteristics.
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申请公布号 |
CA1337788(C) |
申请公布日期 |
1995.12.26 |
申请号 |
CA19890609398 |
申请日期 |
1989.08.25 |
申请人 |
ENZYMOL INTERNATIONAL, INC. |
发明人 |
LIANG, RONG-CHANG;POKORA, ALEXANDER R.;CYRUS, WILLIAM L. JR. |
分类号 |
G03F7/039;G03F7/075;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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地址 |
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