| 摘要 |
PURPOSE:To provide a conductive polarizing plate and its production method by which a polarizing plate having an excellent conductivity and flexibility can be produced, incurring neither deformation of the plate nor reduction in degree of polarization. CONSTITUTION:This conductive polarizing plate consists of a polarizing plate, undercoating layer on the one principal surface of the polarizing plate, and zinc oxide-indium oxide thin film on the undercoating layer. The zinc oxide- indium oxide thin film is an amorphous thin film containing In and Zn as the main cation elements and having the atomic ratio of In to (In+Zn) in the range between 0.55 and 0.9. The conductive polarizing plate is produced by forming a specified undercoating layer on the one principal surface of the polarizing plate and then forming an amorphous zinc oxide-indium oxide thin film on the undercoating layer by sputtering with using a specified sputtering target. This amorphous thin film is formed to have In and Zn as the main cation elements and 0.55 to 0.9 atomic ratio of In to (In+Zn). |
