METHOD OF REPETITIVELY IMAGING A MASK PATTERN ON A SUBSTRATE, AND APPARATUS FOR PERFORMING THE METHOD
摘要
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).
申请公布号
WO9534025(A1)
申请公布日期
1995.12.14
申请号
WO1995IB00341
申请日期
1995.05.09
申请人
PHILIPS ELECTRONICS N.V.;PHILIPS NORDEN AB
发明人
TENNER, MANFRED, GAWEIN;VAN DER WERF, JAN, EVERT;VAN UIJEN, CORNELIS, MARINUS, JOHANNES;DIRKSEN, PETER