发明名称
摘要 <p>PURPOSE:To economically manufacture a Cu-type bar material most suitably used for electronic equipment parts by plating a base material of Cu alloy bar with high-purity Cu and by rolling the plated material so as to reduce the surface layer Cu to specified thickness. CONSTITUTION:The base material of Cu alloy bar is subjected to high-purity Cu plating or PVD treatment; the Cu used here is oxygen-free copper. After that the material is worked by rolling at >=10% total draft by use of smooth rolls for rolling and a low-viscosity lubricant in combination so as to reduce the thickness of the Cu surface layer to 0.5mu, preferably 1-5mu. In this way, the high quality and high efficiency Cu bar material most suitably used for electronic equipment parts can be obtained.</p>
申请公布号 JPH07116573(B2) 申请公布日期 1995.12.13
申请号 JP19850043434 申请日期 1985.03.05
申请人 发明人
分类号 H01B5/02;B21H8/00;B23K20/04;C22F1/00;C22F1/08;H01B13/00;H01L23/48;H01L23/50;(IPC1-7):C22F1/08 主分类号 H01B5/02
代理机构 代理人
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