发明名称 Mask, mask producing method and pattern forming method using mask.
摘要 A mask includes a transparent layer (2) which is transparent with respect to a light which is used for an exposure, and a mask pattern layer (5) which is formed on the transparent layer. At least a portion of the mask pattern layer (5) is made up solely of a phase shift layer (3a) for transmitting the light, so that a phase shift occurs between a phase of the light transmitted through the phase shift layer and a phase of the light transmitted through a portion of the mask having no phase shift layer.
申请公布号 EP0653679(A3) 申请公布日期 1995.12.13
申请号 EP19950101229 申请日期 1990.04.26
申请人 FUJITSU LIMITED 发明人 KAWABATA, TOSHIAKI, C/O FUJITSU LTD.;NAKAGAWA, KENJI, C/O FUJITSU LTD.;YAMAGUCHI, SEIICHIRO, C/O FUJITSU LTD.;TAGUCHI, MASAO, C/O FUJITSU LTD.;SUMI, KAZUHIKO, C/O FUJITSU LTD.;YANAGISHITA, YUICHIRO, C/O FUJITSU LTD.
分类号 G03F1/00;G03F1/34;G03F1/68;G03F1/80;H01L21/027;H01L21/30;(IPC1-7):G03F1/14 主分类号 G03F1/00
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