| 摘要 |
PURPOSE:To provide a damage evaluating method by which the state of the surface of a part being made amorphous by plasma etching or ion impact at the time of ion implantation and the surface roughness in molecular level can be evaluated easily. CONSTITUTION:For fine particles (0.1mum-1mm diameter) of the same material as a material for a part to be damaged by plasma etching or ion implantation or for fine particles which have practically the same physical properties as those of the material for the part, plasma etching or ion implantation is carried out in the same conditions in which the plasma etching or ion implantation is carried out. After that, the damaged fine particles are made to be sample particles 13, the sample particles 13 are dispersed in a solution 12, and the movement of the sample particles 13 is observed by electrophoresis. Based on the observation results, the kinds of ions adsorbed on the surface of the sample particles 13 and apparent surface electric charge density are computed and the amorphous degree of the surface and surface roughness can be evaluated. |
