发明名称 |
Semiconductor device having an alignment mark |
摘要 |
A semiconductor device having an alignment mark which is improved to enable accurate recognition of the alignment mark is provided. A first interconnection layer is provided on a semiconductor substrate. A second interconnection layer is provided on an interlayer insulating film so that first and second interconnection layers cross each other with interlayer insulating film therebetween. A surface of second interconnection layer includes, in a region where first and second interconnection layers cross each other, a flat portion which reflects laser beam vertically and upwardly and a portion including concaves and convexes which reflects laser beam irregularly, which together form an alignment mark.
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申请公布号 |
US5475268(A) |
申请公布日期 |
1995.12.12 |
申请号 |
US19940357282 |
申请日期 |
1994.12.13 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
KAWAGOE, TOMOYA;OISHI, AKIHISA;NIIRO, MITSUTAKA;DOSAKA, KATSUMI |
分类号 |
H01L21/68;H01L21/027;H01L21/822;H01L23/544;H01L27/04;(IPC1-7):H01L23/48;H01L23/522 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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