发明名称 Semiconductor device having an alignment mark
摘要 A semiconductor device having an alignment mark which is improved to enable accurate recognition of the alignment mark is provided. A first interconnection layer is provided on a semiconductor substrate. A second interconnection layer is provided on an interlayer insulating film so that first and second interconnection layers cross each other with interlayer insulating film therebetween. A surface of second interconnection layer includes, in a region where first and second interconnection layers cross each other, a flat portion which reflects laser beam vertically and upwardly and a portion including concaves and convexes which reflects laser beam irregularly, which together form an alignment mark.
申请公布号 US5475268(A) 申请公布日期 1995.12.12
申请号 US19940357282 申请日期 1994.12.13
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KAWAGOE, TOMOYA;OISHI, AKIHISA;NIIRO, MITSUTAKA;DOSAKA, KATSUMI
分类号 H01L21/68;H01L21/027;H01L21/822;H01L23/544;H01L27/04;(IPC1-7):H01L23/48;H01L23/522 主分类号 H01L21/68
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