发明名称 GROWTH METHOD FOR II-VI COMPOUND SEMICONDUCTOR
摘要 PURPOSE:To provide a growth method for a p-type II-IV compound semiconductor whose acceptor concentration is enough high. CONSTITUTION:When a p-type II-VI compound semiconductor such as p-type ZnSe is formed by a metal organic chemical vapor deposition or a molecular beam epitaxy using raw gas material, organic compound such as diisopropyl amine wherein at least one nitrogen atom is contained and at least two groups whose molar weight is at least 12, properly larger than 36 are bonded to the nitrogen atom is used as p-type dopant.
申请公布号 JPH07326585(A) 申请公布日期 1995.12.12
申请号 JP19940141236 申请日期 1994.05.31
申请人 SONY CORP 发明人 TODA ATSUSHI;IMANISHI DAISUKE
分类号 H01L21/205;C30B23/02;C30B25/02;H01L21/365 主分类号 H01L21/205
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