STRUCTURE AND MANUFACTURING METHOD OF PHOTO DEVICE

摘要

The method is for compensating the temperature effect of an optical device which is sensitive to operating temperature. The method comprises the steps of; (A)injecting impurity into a substrate and vaporizing a first electrode; (B)forming a photoresist, exposing, and etching to form a first electrode; (C)vaporizing dielectric material to form a dielectric insulating layer; and (D)forming a second electrode on the dielectric insulating layer.