发明名称 SUBSTRATE MANIPULATOR
摘要 <p>PURPOSE:To prolong the life of a bearing greatly in a substrate manipulator of a device for forming a semiconductor thin film in an ultra-high vacuum. CONSTITUTION:A permanent magnet 8 is arranged in an axial direction of a ring-shaped driving side yoke 9, a magnetic coupling is constituted of it and a ring-shaped slave side yoke 10 arranged in vacuum with a vacuum partition 7 between and magnetic attraction force is made to work in an opposite direction of a direction (gravity direction) of a load of the slave side yoke 10.</p>
申请公布号 JPH07321182(A) 申请公布日期 1995.12.08
申请号 JP19940114923 申请日期 1994.05.27
申请人 HITACHI LTD 发明人 FUJITA MINORU;MIYATA TOSHIMITSU
分类号 H01L21/68;H01L21/203;H01L21/205;H02K49/00;(IPC1-7):H01L21/68 主分类号 H01L21/68
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