| 摘要 |
PURPOSE:To evaluate a film thickness simply and with high precision by measuring the transmittance and the reflection factor of a thin film when light at a prescribed wavelength is incident on the thin film-whose film thickness is unknown. CONSTITUTION:In a standard sample 1, a thin film 12 of chromium oxide or the like in a thickness of d1 is formed on a quartz substrate 11. In a standard sample 2, a thin film 13 of chromium oxide or the like in a thickness of d2 is formed on a quartz substrate 11. In a data input part 21, individual measured values of the film thickness, the transmittance and the reflection factor of the standard samples 1, 2 as well as of the transmittance and the reflection factor of a thin film, to be measured, whose film thickness is unknown are input from the outside. An arithmetic part 22 finds individual computed values of the refractive index and the attenuation coefficient of the standard samples 1, 2 as well as of the film thickness of the thin film to be measured, and it judges and evaluates a solution in which an optical constant coincides with values of the film thickness, the transmittance and the reflection factor by the standard samples 1, 2. The individual measured values and the individual computed values are stored in a data storage part 23 temporarily or permanently, and a data output part 24 outputs the individual measured values and the individual computed values to the outside as an RT chart or numerical values. |
