发明名称 ELECTROSTATIC ATTRACTION DEVICE
摘要 <p>PURPOSE:To make an attraction surface highly accurate by a simple structure by using just one dielectric material and by thinning a dielectric at a part of a small area in a plurality of places of a member for ensuring specified attraction force. CONSTITUTION:A small hole 3 is provided to a part of a member in a plurality of places of an insulating dielectric 1. It is arranged so that a total area of a hole part occupies half of an entire of an attraction surface. Alumina ceramics are used as a dielectric. Electrodes 5, 6 are formed of plating. The dielectric constant of alumina ceramic is 10.2. When the thickness is one fourth of an original one in half of an attraction area, that is, a thickness (b) is 0.5mm, attraction force 4.25 times attraction force obtained when an attraction part thickness is 2mm in the dielectric material can be acquired. Thereby, it is possible to realize an electrostatic attraction device of large attraction force and highly accurate surface precision of an attraction surface at a low cost.</p>
申请公布号 JPH07321186(A) 申请公布日期 1995.12.08
申请号 JP19940110723 申请日期 1994.05.25
申请人 HITACHI LTD 发明人 KUROSAKI TOSHISHIGE
分类号 B23Q3/15;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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