| 摘要 |
<p>PURPOSE:To clean an X-ray mask without damaging it, by retaining a plurality of X-ray masks in a mask cassette, and cleaning the masks by forming a laminar flow of solution between a plurality of the X-ray masks. CONSTITUTION:X-ray masks 17 are set in a mask cassette 8, which is conveyed in a cleaning vessel 3. Chemical liquid in a circulation vessel 30 is loaded in the cleaning vessel 3 through a loading hole 27. The flowing direction of the loaded chemical liquid is limited, and a laminar flow 28 parallel to the mask surface is formed. As the result, large pressure is not applied to the mask surface, and cleaning is enabled without damaging the X-ray mask 17. Thereby the cleaning of an X-ray mask wherein the cleaning in the membrane state was difficult is enabled.</p> |
