| 摘要 |
PURPOSE:To reduce alignment error by forming marks on a plurality of layers and performing alignment on the basis of statistical calculation of the positions of the marks on a plurality of the layers. CONSTITUTION:Alignment marks 11, 13 are formed on an A layer, and alignment marks 12, 14 are formed on a B layer. When the position of shot obtained from the alignment marks 11, 13 on the A layer is (a), measurement error is epsilona, the position of shot obtained from the alignment marks 12, 14 on the B layer is (b), and measurement error is epsilonb, the target position C of shot for forming a C layer is calculated from a formula C=1/2(a+b). Alignment error Eb-cof the B layer and the C layer at this time is given by E bc=1/2(epsilona+(epsilona<2>))<1/2=(epsilona<2>+-epsilonb<2>)<1/2>. Thereby alignment error is more reduced than only the measurement result of the alignment mark on the B layer. |
