发明名称 SUBSTRATE TREATING DEVICE
摘要 <p>PURPOSE:To provide a substrate treating device which has a compact constitution and can satisfactorily neutralize static electricity. CONSTITUTION:An ionizer 81 discharges an ionized gas in a direction which is almost parallel to the surface of a substrate 10 held on lift pins 6. A deflecting plate 82a deflects the flow of the gas discharged from the ionizer 81 toward the surface of the substrate 10. Therefore, positive and negative ions can be uniformly diffused and static electricity on the surface of the substrate 10 can be satisfactorily neutralized by preventing the occurrence of an unevenly electrostatically charged state on the surface of the substrate 10 by making the distance until the gas flow discharged from the ionizer 81 reaches the surface of the substrate 10 after it is deflected by the deflecting plate 82a by suitably adjusting the distances from the ionizer 81 to the plate 82a and from the plate 82 to the surface of the substrate 10. In other words, the size of a substrate treating device can be reduced as a whole by reducing the vertical size of the device.</p>
申请公布号 JPH07321000(A) 申请公布日期 1995.12.08
申请号 JP19940106679 申请日期 1994.05.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KIZAKI KOJI;KITAZAWA HIROYUKI
分类号 H01L21/683;H01L21/027;H01L21/304;H01L21/68;(IPC1-7):H01L21/027 主分类号 H01L21/683
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