发明名称 Wafer used in dielectric arrangements
摘要 A wafer (10) comprises a working layer (13) and a handling layer (11). The working layer is divided into sections by recesses (15). Each section has moulded sec. surfaces (16) through the recesses. A getter layer (17) is present on at least one part of the sec. surfaces. Prodn. of the wafer is also claimed.
申请公布号 DE19519533(A1) 申请公布日期 1995.12.07
申请号 DE1995119533 申请日期 1995.05.27
申请人 AT & T CORP., NEW YORK, N.Y., US 发明人 FASTER, WILLIAM GRAHAM, WERNERSVILLE, PA., US
分类号 H01L21/322;H01L21/762;(IPC1-7):H01L27/04 主分类号 H01L21/322
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