,申请号JP19890258057-传众专利搜索

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法人/股东/高管

发明名称
摘要	An electrode plate for plasma etching made of a high-purity glassy carbon having characteristics of a maximum pore diameter of 1 mu m or less, an average pore diameter of 0.7 mu m or less and a porosity of 1 % or less.
申请公布号	JPH07114198(B2)	申请公布日期	1995.12.06
申请号	JP19890258057	申请日期	1989.10.02
申请人	TOKAI CARBON KK	发明人	ITO HAJIME
分类号	H01L21/302;C01B31/02;H01J9/14;H01J37/32;H01L21/3065	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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