| 摘要 |
PURPOSE:To obtain an interatomic force microscope in a non-contact mode having a cantilever having a high quality factor by forming a self-exciting means on the cantilever with a probe for detecting interatomic force and exciting the cantilever in frequency close to resonance frequency. CONSTITUTION:An Si3N4 film 2 is formed onto an Si substrate 1, a probe 3 corresponding section is removed through dry etching, and an etch-pit as a probe 3 is formed through etching by KOH. The Si3N4 film is deposited, and an MgO film 4 as a buffer layer is sputtered onto the Si3N4 film. A Pt lower electrode 5 is formed through photolithography and sputtering. A resist pattern is formed through photolithography, a section except a cantilever 6 is removed through dry etching, and a cantilever 6 body is formed through etching. A PZT film 7 is sputtered, and a Pt upper electrode 8 is evaporated in a mask shape. Accordingly, the quality factor of the vibrations of the acquired cantilever 6 reaches approximately decuple as large as that of external excitation.
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