发明名称 Field effect transistor and method for producing the field effect transistor
摘要 In a field effect transistor including a Schottky gate electrode disposed on an active region in a compound semiconductor substrate, a compressive stress of the gate electrode and a tensile stress of an insulating film serving as a passivation are concentrated on the lower edges of the gate electrode, whereby positive piezoelectric charges are produced in the compound semiconductor substrate in the vicinity of the gate electrode. The positive piezoelectric charges increase the effective donor concentration, reducing the thickness of the surface depletion layer. As the result, channel narrowing due to the surface depletion layer is suppressed.
申请公布号 US5471073(A) 申请公布日期 1995.11.28
申请号 US19930114369 申请日期 1993.09.01
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KOHNO, YASUTAKA
分类号 H01L21/265;H01L21/302;H01L21/3065;H01L21/318;H01L21/338;H01L29/08;H01L29/812;(IPC1-7):H01L29/48 主分类号 H01L21/265
代理机构 代理人
主权项
地址
您可能感兴趣的专利