RESIST COMPOSITION

摘要

the present invention is directed to a quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): <IMG> (I) wherein Y1 and Y2 each represent a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y1 and Y2 is a hydroxyl group; Z1, Z2, Z3, Z4, Z5, Z6 and Z7 are the same or different and each represent a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z1, Z2, Z3, Z4, Z5, Z6 and Z7 are hydroxyl groups; R1, R2 and R3 are the same or different and each represent a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.