| 摘要 |
<p>PURPOSE:To produce such a black matrix substrate at low cost that has enough resolution and high optical density even when proximity exposure is adopted. CONSTITUTION:A photosensitive resin layer 3 is formed on a transparent substrate 13 using a water-soluble photosensitive resin comps. This resin compsn. contains a crosslinking agent having water-soluble azide compd. and a water-soluble resin having a polymer obtd. by using at least one kind of acryl amide monomer selected from the monomer group of alpha-substituion of acylamide, N- monosubstitution of acylamide, N,N-disubstitution of acrylamide and N- monosubstitution of methacrylamide. After the photosensitive resin layer 3 is formed into a relief 4 having a pattern for a black matrix, the relief 4 is brought into contact with an electoless plating liquid to form a light-shielding layer 14 having the pattern for a black matrix. Thus, the black matrix substrate 13 is obtd.</p> |
