ELECTRON-BEAM EXPOSURE MASK, ITS MANUFACTURE AND ELECTRON-BEAM EXPOSURE METHOD

摘要

PURPOSE:To form the pattern of good accuracy even when a charged-particle transmission part contains a pattern which is formed to be island-shaped or peninsula-shaped. CONSTITUTION:In an electron-beam exposure mask which forms a pattern by one shot, electron-beam shielding patterns 21 which shield chanrged particles and a plurality of opening parts 22, 23, 26 which are arranged in lines along peripheral edges of the charged-particle shielding patterns 21 so as to sandwich beams 24, 25, 27 are contained.