| 摘要 |
A phase shift optical mask is used for exposing a pattern using an exposure light. The phase shift optical mask includes a substrate (1, 6) which is transparent with respect to the exposure light, a light-blocking layer (2, 3; 7, 8) which is non-transparent with respect to the exposure light and is provided on the substrate, where the light-blocking layer has an opening (5, 10) having a predetermined shape and size and being defined by a side wall of the light-blocking layer, and a phase shift layer (4, 9) which is transparent with respect to the exposure light and is provided on the light-blocking layer and the substrate which is exposed within the opening. The phase shift layer (4, 9) has a uniform thickness, and the light-blocking layer (2, 3; 7, 8) has a predetermined thickness (PS) so that a phase of the exposure light transmitted through the phase shift layer provided on the side wall of the light-blocking layer is shifted by approximately 180 DEG relative to a phase of the exposure light transmitted through the phase shift layer provided on the substrate. <IMAGE> |
