发明名称 METHOD OF COATING A SUBSTRATE WITH COPPER
摘要 <p>A method of coating a substrate with copper which involves applying to the substrate an aqueous copper formate solution and irradiating the substrate to which the copper formate solution has been applied with radiation from an excimer lamp having a wavelength effective to coat the substrate with copper. Such radiation desirably has a wavelength of 172 nm. The aqueous copper formate solution includes water, copper formate, a surfactant, and an effective amount of a photo-redox facilitator.</p>
申请公布号 WO1995031586(A1) 申请公布日期 1995.11.23
申请号 US1995005754 申请日期 1995.05.09
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