发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 PURPOSE:To provide a VMT in which a transverse propagation mode hardly exists and which uses a genuine quantum wire. CONSTITUTION:A semiconductor device is provided with a GaAs substrate 33 which has a superlattice structure 37 constituted of a delta-doped n-type GaAs layer 34 and of a delta-doped p-type GaAs layer 36 and in which a slope 41 has been formed, with an AlGaAs barrier layer 45 which has been formed on the slope 41 and with a modulation doped HEMT structure 47 which is formed on the AlGaAs barrier layer 45. Then, when a bias is applied to the delta-doped n-type GaAs layer 34 and the delta-doped p-type GaAs layer 36, a quantum wire 65 is induced in an interface 67 between the AlGaAs barrier layer 45 and a GaAs active layer 49 along the end part of the delta-doped n-type GaAs layer 34.
申请公布号 JPH07307462(A) 申请公布日期 1995.11.21
申请号 JP19930227617 申请日期 1993.09.13
申请人 TOSHIBA CORP 发明人 JIEMII BAROOZU;POORU OUEN
分类号 H01L29/68;H01L21/335;H01L21/338;H01L29/06;H01L29/12;H01L29/15;H01L29/772;H01L29/778;H01L29/80;H01L29/812;H01L31/0352;(IPC1-7):H01L29/778 主分类号 H01L29/68
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