发明名称 |
QUANTUM WIRE STRUCTURE AND ITS MANUFACTURE |
摘要 |
PURPOSE:To form a fractional supper lattice layer on a buffer layer in a manner that a group of a blocking layer part and well layer part (both are III-V semiconductor layer) will have a highly accurate step cycle in accordance with the tilt angle from a low-index face of a III-V compound semiconductor substrate body in a facial direction and to make the layer to operate as a uniform quantum wire structure. CONSTITUTION:A quantum wire structure is provided with a III-V compound semiconductor layer 10 that is formed on the surface comprised of a step face 4a of a III-V compound semiconductor layer 4 as a first blocking layer and whose thickness is set to be at most three molecular layer through molecular beam epitaxial growth. In addition, the layer 10 is a buffer layer having a surface comprised of a step face 10a that is made of GaAs having a narrower forbidden band width than that of the layer 4 as the first blocking layer and corresponds to a step face 3a of a III-V compound semiconductor layer 3 of a III-V compound semiconductor substrate 1. Then, a fractional supper lattice layer 5 consisting of a semiconductor layer part 5B as a blocking layer and a semiconductor layer part 5W as a well layer is provided on the step 10a. |
申请公布号 |
JPH07307452(A) |
申请公布日期 |
1995.11.21 |
申请号 |
JP19940124540 |
申请日期 |
1994.05.13 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
OSAKA JIRO;WAHO TAKAO |
分类号 |
C30B23/08;C30B29/40;H01L29/06;H01L29/15;H01L29/66;(IPC1-7):H01L29/06 |
主分类号 |
C30B23/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|