| 摘要 |
PURPOSE:To improve the accuracy of an exposure pattern exposed by using a plurality of projection optical systems more than by conventional devices. CONSTITUTION:The relative space of a mask 2 and a photosensitive substrate 3 lightened by a plurality of projection optical systems 12A-12C is obtained regarding arbitrary places prior to exposure, and stored previously in a storage device 19. The relative space of the mask 2 and the photosensitive substrate 3 is controlled so as to satisfy specified relationship on the basis of the relative space at the time of scanning exposure. Accordingly, scanning exposure can be carried out while the space of the mask 2 and the photosensitive substrate 3 in a plurality of exposure regions is kept approximately constant. |
