发明名称 Procédé et dispositif pour la mesure in situ des contraintes se développant au sein d'une couche mince lors de son dépôt sur un substrat.
摘要 A device for use in a processing chamber (11) containing a collective holder (12) with a plurality of sites (14) for receiving substrates to be processed. The device comprises a test sample (16), a light source (35) transmitting a light beam towards the test sample (16), and a sensor (18) for sensing the beam reflected therefrom. Said test sample (16) is arranged on an individual holder (20) which can be fitted in one of the sites (14) on the collective holder (12) and further jointly supports at least the insertable portion (21) of the sensor (18). The device is particularly suitable for providing anti-reflection coatings on lenses for spectacles.
申请公布号 FR2719900(A1) 申请公布日期 1995.11.17
申请号 FR19940005793 申请日期 1994.05.11
申请人 ESSILOR INTERNATIONAL 发明人 FRAKSO FATIMA;BOSMANS RICHARD;NOUVELOT LUC
分类号 C23C14/54;G01L1/24;G01L5/00 主分类号 C23C14/54
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