| 摘要 |
<p>A device for the continuous sputtering processing of the surfaces of moving rotary parts (R), consisting of at least one chamber defining a vacuum processing enclosure in which a plasma may be generated, and communicating with the outside via a feed or loading zone (10, 11) and a discharge or unloading assembly (20, 21). Said processing enclosure is provided with a set (16, 26) of two rotary screw conveyors for transferring the parts (R), which screw conveyors are parallel to the longitudinal axis of the chamber (1, 2), as well as two rails (17, 27) for guiding and supporting the parts (R), which rails are parallel to said screw conveyors and arranged therebetween, and capable of being given a predetermined electrical potential. At least the longitudinal ends of the rails are joined to a sloping ramp (18, 28) for joining them to the loading and unloading zones, and said screw conveyors are positioned and spaced apart according to the size of the part to be processed so that the ends of the part can engage the screw threads and contact the rail, whereby the part rotates as it is transferred between the loading and unloading zones.</p> |
