| 摘要 |
The method involves depositing a pole piece layer on a substrate and depositing a layer of insulation material over the pole piece layer. An electrical coil structure is deposited over the first layer of insulation material. A second layer of insulation material is depositing above the electrical coil structure. A thin layer of photoresist is deposited over the second layer of insulation material and over a portion of the first pole piece layer. A pattern is formed to define at least a portion of the second pole layer. A second thick layer of photoresist is deposited over the first thin layer of photoresist for precisely defining the pattern of the second pole layer. The second pole piece layer is deposited over the second thick layer of photoresist. The two layers of photoresist are deposited by spin coating the photoresist layers at a spin speed of about 800 rpm. |
