| 摘要 |
PURPOSE:To obtain a resist compsn. excellent in balance of various characteristics such as sensitivity, the rate of a residual film, resolution and heat resistance by incorporating quinonediazidosulfonic ester of a specified polyhydroxy compd. as a photosensitive agent. CONSTITUTION:In a positive type resist compsn. contg. an alkali-soluble resin and a quinonediazidosulfonic ester type photosensitive agent, quinonediazidosulfonic ester of a polyhydroxy compd. represented by formula I or II is contained as the photosensitive agent. In the formula I, each of R1-R12 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy. In the formula II, each of R22-R33 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy. |
