发明名称 Projection exposure method and apparatus
摘要 In order to effect projection exposure at a great depth of focus without spoiling transfer fidelity even for a plurality of isolated patterns relatively close to one another, provision is made of a coherence reducing member CCM for reducing the coherency between imaging light in a central circular transmitting portion FA on or near the pupil plane (Fourier transform plane) of a projection optical system and imaging light in a marginal zonal transmitting portion FB, and a double focalizing member DFM for making the in-focus position of light passing through the circular transmitting portion FA and the in-focus position of light passing through the zonal transmitting portion FB differ in the direction of the optical axis of the projection optical system.
申请公布号 US5467166(A) 申请公布日期 1995.11.14
申请号 US19940288074 申请日期 1994.08.10
申请人 NIKON CORPORATION 发明人 SHIRAISHI, NAOMASA
分类号 G02F1/1343;G03F7/20;H01L21/027;(IPC1-7):G03B27/72;G03B27/42 主分类号 G02F1/1343
代理机构 代理人
主权项
地址