发明名称 |
Chemically adsorbed monomolecular lamination film |
摘要 |
The invention to provide a chemically adsorbed monomolecular lamination film comprising a chemically adsorbed monomolecular film formed via a siloxane-based monomolecular or polymer film on a substrate surface. It also seeks to provide a method of forming a chemically adsorbed monomolecular film efficiently and with high density on a substrate surface with few hydroxyl groups, which method comprises a step of contacting a substrate containing hydroxyl groups present on the surface with a non-aqueous solution containing a material with plural chlorosilanol groups in molecule, a step of removing the material remaining on the substrate without reaction by washing the substrate with a non-aqueous organic solution (if this process is omitted, the siloxane-based polymer film is prepared on the substrate), a step of forming a monomolecular film constituted by a compound containing a silanol group in molecule on the substrate by exposing to the air containing moisture or washing with water, after the removal step, and a step of laminating a monomolecular adsorption film by adsorbing a chlorosilane-based surface active agent constituted by a straight hydrocarbon chain having a chlorosilane groups at one end onto the substrate after the monomolecular or polymer film formation step.
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申请公布号 |
US5466486(A) |
申请公布日期 |
1995.11.14 |
申请号 |
US19940316105 |
申请日期 |
1994.09.30 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OGAWA, KAZUFUMI;MINO, NORIHISA;SOGA, MAMORU |
分类号 |
B05D1/18;C08J7/04;C09D4/00;C09D183/08;(IPC1-7):B05D3/02 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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