发明名称 Chemically adsorbed monomolecular lamination film
摘要 The invention to provide a chemically adsorbed monomolecular lamination film comprising a chemically adsorbed monomolecular film formed via a siloxane-based monomolecular or polymer film on a substrate surface. It also seeks to provide a method of forming a chemically adsorbed monomolecular film efficiently and with high density on a substrate surface with few hydroxyl groups, which method comprises a step of contacting a substrate containing hydroxyl groups present on the surface with a non-aqueous solution containing a material with plural chlorosilanol groups in molecule, a step of removing the material remaining on the substrate without reaction by washing the substrate with a non-aqueous organic solution (if this process is omitted, the siloxane-based polymer film is prepared on the substrate), a step of forming a monomolecular film constituted by a compound containing a silanol group in molecule on the substrate by exposing to the air containing moisture or washing with water, after the removal step, and a step of laminating a monomolecular adsorption film by adsorbing a chlorosilane-based surface active agent constituted by a straight hydrocarbon chain having a chlorosilane groups at one end onto the substrate after the monomolecular or polymer film formation step.
申请公布号 US5466486(A) 申请公布日期 1995.11.14
申请号 US19940316105 申请日期 1994.09.30
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OGAWA, KAZUFUMI;MINO, NORIHISA;SOGA, MAMORU
分类号 B05D1/18;C08J7/04;C09D4/00;C09D183/08;(IPC1-7):B05D3/02 主分类号 B05D1/18
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