首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
POSITIVE TYPE RESIST COMPOSITION
摘要
申请公布号
JPH07301916(A)
申请公布日期
1995.11.14
申请号
JP19940114510
申请日期
1994.04.28
申请人
NIPPON ZEON CO LTD
发明人
KAWADA MASAJI;NAKAMURA MASAHIRO
分类号
G03F7/022;H01L21/027;(IPC1-7):G03F7/022
主分类号
G03F7/022
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Directional SIO<sub>2 </sub>etch using low-temperature etchant deposition and plasma post-treatment
Semiconductor devices and methods of manufacturing the same
Semiconductor device with buried gate electrode structures
Method for manufacturing thin film transistor using multi-tone mask
Semiconductor device and method for manufacturing the same
Ion implantation method and ion implantation apparatus
Combinatorial optimization of interlayer parameters
Dicationic liquid salts and methods of use thereof
Modified photosynthetic microorganisms for producing lipids
Cells deficient in CMP-N-acetylneuraminic acid hydroxylase and/or glycoprotein alpha-1,3-galactosyltransferase
Heterologous expression of fungal polyketide synthetic gene in yeast and a method of preparing a compound produced by a protean encoded by the polyketide synthetic gene by the heterologous expression
Chronic lymphocytic leukemia prognosis and treatment
Method for assessing cancerous state
Radiation-sensitive resin composition, polymer, and resist pattern-forming method
Method for producing electrostatic latent image developing toner
Toner compositions and processes
Non-aqueous electrolyte solution for lithium secondary battery and lithium secondary battery including the same
Lug for lithium ion battery
Seal tape and secondary battery using the same
Formation process for lithium-ion batteries