| 摘要 |
PURPOSE:To obtain a resist compsn. of positive type excellent in balance of various characteristics such as sensitivity, the rate of a residual film and resolution by incorporating a specified polyhydroxy compd. CONSTITUTION:A polyhydroxy compd. represented by formula I or II is incorporated into a positive type resist compsn. contg. alkalisoluble phenolic resin and a quinonediazidosulfonic ester type photosensitive agent in place of the alkali-soluble phenolic resin or in combination with the phenolic resin. In the formula I, each of R1-R12 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy. In the formula II, each of R22-R33 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy. |
