| 摘要 |
PURPOSE:To manufacture, in a short time, a plurality of X-ray masks subjected to dimensional correction so as to correspond to X-ray alingers having the respective different illumination optical systems. CONSTITUTION:The title X-ray mask manufacturing equipment is provided with an illumination optical system 42 for illuminating a reticle 11 turning to a negative with a DUV light source (far ultraviolet ray), and a reduction projection optical system 41 for projecting a part of the pattern of the reticle 11 on a mask substrate 51 while reducing the pattern with a specific magnification. A reticle stage 2, as a negative scanning means, retains the system 41, 42 and the reticle 11 turning to the negative, and moves them for scanning. A mask substrate stage 5, as a mask substrate scanning means, retains the mask substrate 51, on which the pattern of the reticle 11 is transferred, parallel with the reticle 11, and moves the mask substrate 51 for scanning. A frame 3 constitutes the states 2, 5 as an unified body. |
