| 发明名称 |
Method and apparatus for cleaning substrates |
| 摘要 |
A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium. |
| 申请公布号 |
AU2282495(A) |
申请公布日期 |
1995.11.10 |
| 申请号 |
AU19950022824 |
申请日期 |
1995.04.10 |
| 申请人 |
VIRATEC THIN FILMS, INC. |
发明人 |
ERIK J. BJORNARD;ERIC W KURMAN;DAVID A SHOGREN;JEFFREY J HOFFMAN |
| 分类号 |
B24C1/00;B24C3/08;H01L21/00 |
主分类号 |
B24C1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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