发明名称 METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE
摘要 PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of <=100mum particle diameter.
申请公布号 JPH07295238(A) 申请公布日期 1995.11.10
申请号 JP19940084838 申请日期 1994.04.22
申请人 TOYOBO CO LTD 发明人 SHIBANO HIROSHI;KAWAHARA KEIZO;ONODERA KOSAKU;TANAKA SHINICHI;TANIYAMA TSUKASA
分类号 G03F7/00;G03F7/32;(IPC1-7):G03F7/32 主分类号 G03F7/00
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