发明名称 |
METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE |
摘要 |
PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of <=100mum particle diameter. |
申请公布号 |
JPH07295238(A) |
申请公布日期 |
1995.11.10 |
申请号 |
JP19940084838 |
申请日期 |
1994.04.22 |
申请人 |
TOYOBO CO LTD |
发明人 |
SHIBANO HIROSHI;KAWAHARA KEIZO;ONODERA KOSAKU;TANAKA SHINICHI;TANIYAMA TSUKASA |
分类号 |
G03F7/00;G03F7/32;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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