| 摘要 |
PURPOSE:To enhance the reproducibility of developed results regardless of the preceding processing by controlling the development while observing the proceeding thereof. CONSTITUTION:An automatic photomask developing system comprises a turn table 2 for mounting and turning a resist substrate 1, a developer supply nozzle 3a at a developer supply section 3, a fixing solution supply nozzle 4a at a fixing solution supply section 4, an air blow 5a for removing the developer, a laser light source 6 for inspecting the proceeding of development, a detector 7 for detecting the diffracted laser light, and a section 8 for controlling the development depending on the output from the detector 7. |
