| 摘要 |
PURPOSE:To improve the cross-sectional profile of a resist pattern by setting a specific relationship between the thickness, the exposing wavelength and the refractive index of an underlying film, i.e., setting a node of a standing wave at the interface. CONSTITUTION:A light reflected on the interface between a substrate 1 and an underlying film 2 interferes with a light reflected on the interface between the underlying film 2 and a chemical amplification resist 3 and produces a standing wave when the thickness of the underlying film 2 is set at a predetermined value. The thickness (d) of the underlying film 2, the exposing wavelength lambda, and the refractive index (n) of the underlying film 2 satisfy a relationship; 2d=2mlambda/(2n), where (m) is a natural number. In other words, the thickness of the underlying film 2 is set such that the node of a standing wave is located on the interface between the underlying film 2 and the chemical amplification resist 3. This method provides a good cross-sectional profile. |
