发明名称 |
PHOTOSENSITIVE COMPOSITION |
摘要 |
PURPOSE:To obtain a photosensitive compsn. excellent in alkali developability, plate wear, stain resistance and preservability. CONSTITUTION:This photosensitive compsn. contains a compd. having at least one addition-polymerizable ethylenically unsatd. double bond, an acidic vinyl copolymer contg. constituent units each derived from a vinyl monomer having an arom. hydroxyl group in each molecule and soluble or swellable in an alkaline aq. soln., a photopolymn. initiator and diazo resin which is a co-condensed compd. contg. constituent units each derived from an arom. compd. having at least one of carboxyl and hydroxyl groups and constituent units each derived from an arom. diazonium compd. in each molecule. |
申请公布号 |
JPH07295213(A) |
申请公布日期 |
1995.11.10 |
申请号 |
JP19950040471 |
申请日期 |
1995.02.28 |
申请人 |
MITSUBISHI CHEM CORP;KONICA CORP |
发明人 |
TSUJI SHIGEO;MURATA MASAHISA;MATSUMURA TOMOYUKI;ISHII NOBUYUKI;KIZU NORIYUKI |
分类号 |
G03F7/021;G03F7/00;G03F7/027;G03F7/028;G03F7/033;(IPC1-7):G03F7/021 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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