| 摘要 |
<p>A method for manufacturing an optical grating. A substrate (810) is supported on a rotatable support at a first position relative to a pair of coherent light sources (C, D). A photosensitive layer (818) is formed on the surface of the substrate (810), and a mask (820) is formed over a first portion of the photosensitive layer (818), while leaving a second portion of the photosensitive layer (818) unmasked. The unmasked portion of the photosensitive layer (818) is holographically exposed to an interference light pattern from the light sources (C, D) to form a first grating surface pattern (826). The first grating surface pattern (826) is masked, and the mask (820) over the first portion of the photosensitive layer (818) is removed. The substrate (810) is rotated 180 degrees to a second position and the unmasked first portion is holographically exposed. The exposed photosensitive material is developed to form a grating on the substrate (810).</p> |
