发明名称 |
Semiconductor wafer inspection apparatus |
摘要 |
Disclosed is a semiconductor wafer inspection apparatus which effectively prevents an erroneous identification of small pits as particles on a surface of a sample. In such a semiconductor wafer inspection apparatus, a light collecting portion and a reflection adjustment portion having a light reflectance different from a light reflectance of the light collecting portion are included in light collecting means.
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申请公布号 |
US5465145(A) |
申请公布日期 |
1995.11.07 |
申请号 |
US19940309999 |
申请日期 |
1994.09.20 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATION |
发明人 |
NAKASHIGE, YUKIKO;NISHIOKA, TADASHI |
分类号 |
G01B11/30;G01N21/94;H01L21/66;(IPC1-7):G01N21/88 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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