ELECTRODE PLATE FOR PLASMA ETCHING AND ITS PRODUCTION

摘要

PURPOSE:To provide an electrode plate for plasma etching and a method for producing it in which foreign particles such as carbon ones that fall and stick to the surface of a wafer on etching are small in number and the consumption speed of the plate is slow. CONSTITUTION:An electrode plate for plasma etching consisting of a glassy carbon is provided by using phenol-formaldehyde resin of 250-310 number average molecular weight and 100-320cp viscosity at 25 deg.C. Solution of phenol- formaldehyde resin of 250-310 number average molecular weight and 100-320cp viscosity at 25 deg.C is formed and hardened before it is subjected to carbonization and high temp. treatment.