| 摘要 |
Neutral single-source molecular organic precursors containing tetradentate tripodal chelating ligands are provided that are useful for the preparation of films chemical vapor deposition. These complexes can be generally represented by the formula <IMAGE> wherein "M" is selected from the group consisting of a lanthanide, an actinide, a Group IIIA metal, a Group IIIA metalloid, a Group IVA metal, a Group IVA metalloid, a Group VA metal, a Group VA metalloid, a Group IIIB metal, a Group IVB metal, a Group VB metal, a Group VIB metal, a Group VIIB metal, and a Group VIIIB metal. The ligand "Z", when present (k=1), is selected from the group consisting of hydrogen, halide, and a group bonded to "M" through N, O, P, S, As, Si, or C. "Ec" is N, P, or As, and m=0-1. When "Et" is N, P, or As, m=1. When "Et" is O, S, or Se, m=0. Each "R1" is selected from the group consisting of hydrogen, (C1-C20)alkyl, (C2-C20)alkenyl, (C2-C20)alkynyl, (C6-C18)aryl, (C7-C20)aralkyl, a (C5-C18)heterocycle, and triorganosilyl. In -[C(R 2)2]n-, n=1-4, and each "R2" is selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, aryl, aralkyl, and a heterocycle.
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