| 摘要 |
<p>This apparatus comprises a substrate (31) made of fine ceramic, and an electrode (55) buried in the substrate (31) and electrically insulated in it, wherein a plasma is produced on the substrate. The apparatus includes a layer (37) permeable to electromagnetic waves, and preferably, the average thickness of the layer is 0.5 mm or more. The electrode (55) is a flat electrode formed by a bulk metal. The substrate which encloses the electrode is a product integrally formed by sintering without junctions. This structure can also be utilized for an electric dust collector, an electromagnetic shielding device, and an electrostatic chuck. These devices can be preferably installed in an apparatus using a corrosive halogen gas for fabricating semiconductors or the like. A compact, together with a flat bulk metal electrode, is sintered by a hot press with a pressure in the thickness direction of the electrode in such a manner that the electrode is buried integrally in a fine ceramic substrate without junctions. A material permeable to electromagnetic waves is used for an apparatus for generating plasma by applying a high-frequency power to a gas. At least the surface of this material, which is in contact with the plasma atmosphere, is made of the aluminum nitride whose dielectric loss tan delta is 10<-><2> or less, and thermal resistance shock DELTA Tc is 300 DEG or more. <IMAGE></p> |
