| 摘要 |
<p>PURPOSE:To provide a colored pattern developing method and device for a color filter to form a fine colored pattern so that development can be performed with rather wide range of the allowance for the developing time to prevent peeling of the pattern due to overdevelopment and that good development which hardly produces development sludge can be performed. CONSTITUTION:A pigment dispersion-type photoresist 2 is applied on a filter substrate 1 and exposed to form a pattern. The substrate 1 is dipped in a developer (a) in a first developing tank 18 for dipping development. Then the substrate 1 is sprayed with a developer (a) in a second developing tank 28 for the second development. Then the substrate is subjected to washing treatment by rinsing or spraying water. Thus, a colored pattern 2a of the color filter is formed on the filter substrate 1.</p> |
